Erwin Olaf, Hans Op de Beeck – Inspired by Steichen

Erwin Olaf & Hans Op de Beeck: Inspired by Steichen

Edward Steichen is renowned as one of the most prolific and influential figures in the history of photography. Marking the 50th anniversary of his death, this exciting exhibition in the National Museum of History and Art of Luxembourg, showcases the work of two eminent contemporary artists, Dutch photographer Erwin Olaf and Belgian visual artist Hans Op de Beeck. The show creates surprising connections between the three artists. Although very different, they come together like virtuoso musicians, creating a new harmony, a richly variegated presentation of imagery in black, white and grey tones that is strikingly unified and self-evident.

To communicate on this exhibition, A DESIGNERS’ COLLECTIVE created a series of posters, each showing a work of either Edward Steichen, Erwin Olaf or Hans Op de Beeck. To create a clear visual harmony, they created a typographic ‘stamp’ connecting the names of the three artists.